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/ Photoresist - SIPR/SEPR/ SAIL/SEVR/SHB/ODL series & Photomask blanks

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Photoresist - SIPR/SEPR/ SAIL/SEVR/SHB/ODL series & Photomask blanks

Photoresists are photosensitive resins that are used in the lithography process to transfer circuit patterns, such as those for semiconductors, on a silicon wafer. They form circuit patterns on the surface of a silicon wafer with photochemical reaction caused by light irradiation through a photomask on which the circuit patterns are drawn.

Photomask blanks, which are the base material of photomasks that are light-shielding thin films on a synthetic quartz substrate, are used as the patterning template of circuits to be transferred on a silicon wafer in the semiconductor lithography process.

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Shin-Etsu photoresists support advanced lithography using the light source from i-line, KrF, ArF to EUV. We also provide spin-on middle/under-layer hardmasks used in the nanofabrication process.

Shin-Etsu meets customers’ requests with a wide range of product lines including OMOG (Opaque MoSi on Glass) blanks using MoSi binary as light-shielding film with excellent etching properties instead of conventional Chromium (Cr) binary, and half-tone phase shift photomask blanks.

Applications: