Tokyo Ohka Kogyo has been engaged in research and development, manufacturing, and sales of resists starting with rubber-based negative resists until present day. We are also continuing to research and develop EUV resists with absorption wavelength of 13.5nm, the most advanced technology today, and are already approved for use in mass production lines. We will continue our corporate activities to respond to the voices and demands of our customers.
I-Line Resist Lineup
G-Line Resist
ArF Resist
KrF Resist Lineup
KrF Resist (TDUR-P6159)
KrF Resist (TDUR-P7117)
Roll Coater Resist
Deep Dry Etching Resist
Redistribution Layer (RDL) Resist
Stripping Solution for Thick Films
Developer Solution
Film Formation Materials
Photosensitive Permanent Films
Photosensitive Adhesive Materials
Surface Treatment Technology
Porous Polyimide Film
Super Hydrophilic Coating Materials
Super Hydrophilic Coating Materials With Enhanced Durability
Structure Forming Photosensitive Permanent Film Materials
Micro physiological system Fluid3D-X®
