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Our Advance Accredited ChemTrace Labs (AACL) provide wafer surface analysis techniques with high sensitivity for trace metals, organics and particles ─ contaminants that can directly impact device performance. Whether the area of concern is the full wafer surface, a target surface region or a profile into the film, our suite of techniques delivers results.
Bevel deposition and cleanliness are increasingly critical primarily to avoid performance impacts in subsequent production steps. These impacts include film delamination and peeling as well as particle generation. In addition to typical shorting and bridging issues of surface particles, the particles created by metal films contribute to arcing events resulting in structural damage to the wafer. Increasingly, bevel etch steps are being introduced and characterization of the efficacy of these process steps is a growing area of analysis
Every wafer produced has a different path through the fab (or lab) when tracked to the process chamber level. When considering contributors to device performance variability, the processing chamber is a crucial control point to be assessed. As ceramic, metal and polymeric components wear and are replaced across the lifetime of the tool, we must understand and control the chamber environment, characterizing and systematically monitoring at the chamber- and tool level. As critical dimensions shrink, this has moved beyond something that supports consistently high yields to something critical for managing device variability.
Particles, organics, trace metals, anions and cations are possible forms of micro-contamination that occur within chamber environments. Advance Accredited ChemTrace Labs participate in the analysis of components in all stages of the production process from cleanliness validation of a cleaned, machined part to the in-chamber qualification of a part and/or process, to the Certification of Analysis (COA) of a cleaned, recycled part that will return into the fab (or lab) environment
Our Advance Accredited ChemTrace Labs (AACL) provide comprehensive cleanroom AMC monitoring programs for metallic, ionic and organic contamination to enable the fab to remain consistently and reliably below AMC target levels. The benefits of AMC monitoring include identification
