This helps to suppress standing waves caused by interference within the resist layer during exposure, which can lead to variations in sidewall profiles and critical dimensions. As a result, BARC improves the accuracy of lithography.
We supply BARC materials that do not contain PFOS and PFOA, which are internationally regulated as persistent organic pollutants.
I-Line Resist Lineup
G-Line Resist
ArF Resist
KrF Resist Lineup
KrF Resist (TDUR-P6159)
KrF Resist (TDUR-P7117)
Roll Coater Resist
Deep Dry Etching Resist
Redistribution Layer (RDL) Resist
Stripping Solution for Thick Films
Developer Solution
Film Formation Materials
Photosensitive Permanent Films
Photosensitive Adhesive Materials
Surface Treatment Technology
Porous Polyimide Film
Super Hydrophilic Coating Materials
Super Hydrophilic Coating Materials With Enhanced Durability
Structure Forming Photosensitive Permanent Film Materials
Micro physiological system Fluid3D-X®
