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EUV materials for negative tone imaging
Product Lineup
- EUV NTI CAR
- EUV NTI developer DP819A
Features & Benefits
- PAG connected photo decomposable quencher (PCP) with a reaction control function of the resist is introduced. By maintaining a uniform acid concentration in the film during exposure, the LWR, which has been a problem with conventional chemically amplified resists, is reduced.
- NTI developer using high-purity organic solvent suppresses resist swelling and defects during development for high patterning accuracy.
