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The main areas of application for both power ranges are the plasma applications activation, cleaning, etching, semiconductor (front-end), semiconductor (back-end), and plasma polymerisation. Impedance matching can either be done manually (hand-matching) or automatically (auto-matching); this is necessary in any case. Accordingly, the HF system comprises a generator and matching.
While in manual matching the matching must be set at each process start and checked and readjusted every now and then during the process, the capacitors are set automatically and readjusted if changes occur
Other options include display of forward and reverse power, safety cut-off via door switch and vacuum safety switch, quartz-stabilised frequency to comply with DIN EN 55011, and a PC interface.
